Ellipsometry is a versatile and powerful optical technique for the investigation of dielectric properties of thin films. Using an intense solid state laser (658 nm), light is reflected off of a sample and the change in the polarization of the light is detected. Imaging allows a direct view onto the sample surface via a CCD camera. This allows for qualitatively determining the homogeneity of the sample surface to examine the surface structure. Point measurements on well-defined regions of interest as easily obtainable.